Description

Yashwantrao Chavan Maharashtra Open University (YCMOU)

Yashwantarao Chavan Maharashtra Open University, Nashik
Dnyangangotri, Near Gangapur Dam, Govardhan Nashik-422222

V153 M.Sc. (PHYSICS) (SEM-III)
PHY 606- PHYSICS OF THIN FILM
Home Assignments (Year 2024-25)

SEMESTER – III
PHY 606: Physics of Thin Film Marks: 20
HOME ASSIGNMENT-1
Q.1 Solve following Long Answer Question. Marks: 10
a) Explain the Thin film concept in details also give the techniques employed to fabricate thin films
Q.2 Solve following Short Answer Questions. Marks: 10
a) Explain in brief chemical vapor deposition 5 Marks
b) What are the types of sensors that employ thin films? Explain in brief. 5 Marks

HOME ASSIGNMENT-2
PHY 606: Physics of Thin Film Marks: 10
Q. Solve following Multiple Choice Questions (MCQ). (Each-01 Marks) 10 Marks
1. Which of the following is the primary purpose of vacuum techniques in scientific applications?
a. Increase pressure b. Decrease pressure
c. Stabilize temperature d. Control humidity
2. What is the primary driving force behind the capillarity model in thin film deposition?
a. Electrical conductivity b. Surface tension
c. Chemical reactivity d. Thermal expansion
3. Consider a crystal growing on a substrate. The growth rate of the crystal is 1 nm/s, and the height of the crystal is 100 nm. Determine the growth time required to reach a height of 200 nm.
a. 100 seconds b. 200 seconds c. 300 seconds d. 400 seconds
4. Which of the following processes is a common method used in Physical Vapor Deposition (PVD) to deposit thin films?
a. Electroplating b. Sputtering c. Chemical vapor deposition (CVD) d. Anodization
5. Which of the following materials is commonly deposited using Chemical Vapor Deposition (CVD)?
a. Silicon dioxide (SiO₂) b. Copper (Cu) c. Gold (Au) d. Polyethylene
6. In Molecular Beam Epitaxy (MBE), the molecular beams are directed at the substrate in which kind of environment?
a. High-pressure environment b. Ultra-high vacuum environment
c. Normal atmospheric pressure environment d. Low vacuum environment
7. Which type of light source is commonly used in the photolithography process to transfer
patterns onto a photoresist?
a. Infrared light b. Visible light c. Ultraviolet (UV) light d. X-ray
8. Which model is commonly used to explain the increase in resistivity of thin films as thickness decreases?
a. Drude model b. Fuchs-Sondheimer model
c. BCS theory d. Bloch-Grüneisen model

9. In which test is a tape used to pull off a thin film to assess its adhesion to the substrate?
a. Peel test b. Tape test
c. Pull-off test d. Shear test
10. What is the typical thickness of the resistive layer in thin film resistors?
a. 1-10 nanometers b. 10-100 nanometers
c. 100-1000 nanometers d. 1-10 micrometers